Busch, R., Czerner, P., Wahl, M. und Choubey, B. (2025) „Yield prediction in semiconductor manufacturing using two-step machine learning.“, International Journal of Production Research, S. 1-18. doi:10.1080/00207543.2025.2601804.
Chicago Manual of Style 17th edition (full note)Busch, Rebecca, Peter Czerner, Michael Wahl, und Bhaskar Choubey. „Yield Prediction in Semiconductor Manufacturing Using Two-Step Machine Learning.“. International Journal of Production Research, 12. Dezember 2025, 1-18. https://doi.org/10.1080/00207543.2025.2601804.
American Psychological Association 7th editionBusch, R., Czerner, P., Wahl, M., & Choubey, B. (2025). Yield prediction in semiconductor manufacturing using two-step machine learning. International Journal of Production Research, 1-18. https://doi.org/10.1080/00207543.2025.2601804
Modern Language Association 9th editionBusch, R., P. Czerner, M. Wahl, und B. Choubey. „Yield Prediction in Semiconductor Manufacturing Using Two-Step Machine Learning.“. International Journal of Production Research, Dezember 2025, S. 1-18, https://doi.org/10.1080/00207543.2025.2601804.
ISO-690 (author-date, Deutsch)BUSCH, Rebecca, Peter CZERNER, Michael WAHL und Bhaskar CHOUBEY, 2025. Yield prediction in semiconductor manufacturing using two-step machine learning. International Journal of Production Research. 12 Dezember 2025. S. 1-18. DOI 10.1080/00207543.2025.2601804